Product Description
Materials and Processes for Next Generation Lithography
Including information on processing and metrology techniques, this book brings together the world's foremost resist development scientists from various communities to produce a definitive description of the many approaches to lithography fabrication
Alex Robinson (Volume editor), Richard Lawson (Volume editor)
9780081003541
Hardback, published 18 November 2016
634 pages
23.5 x 19 x 3.5 cm, 1.45 kg
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.
These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel appro]
Materials and Processes for Next Generation Lithography Robinson Volume 11
Materials and Processes for Next Generation Lithography
Including information on processing and metrology techniques, this book brings together the world's foremost resist development scientists from various communities to produce a definitive description of the many approaches to lithography fabrication
Alex Robinson (Volume editor), Richard Lawson (Volume editor)
9780081003541
Hardback, published 18 November 2016
634 pages
23.5 x 19 x 3.5 cm, 1.45 kg
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.
These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel appro]
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