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Optical Diagnostics for Thin Film Processing Herman Hardback Academic Press

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Optical Diagnostics for Thin Film Processing

Irving P. Herman (Author)

9780123420701

Hardback, published 23 October 1996

783 pages

22.9 x 15.2 x 4 cm, 1.22 kg

\""The greatest value of Optical Diagnostics for Thin Film Processing is a comprehensive reference text. I highly recommend it to anyone who wants to seriously delve into the field of thin film optical diagnostics or wants a single source book of well-organized and very high-density information on this subject.\"" --William G. Breiland, Sandia National Laboratories, OPTICAL ENGINEERING

This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, in]

Optical Diagnostics for Thin Film Processing Herman Hardback Academic Press

Optical Diagnostics for Thin Film Processing

Irving P. Herman (Author)

9780123420701

Hardback, published 23 October 1996

783 pages

22.9 x 15.2 x 4 cm, 1.22 kg

\""The greatest value of Optical Diagnostics for Thin Film Processing is a comprehensive reference text. I highly recommend it to anyone who wants to seriously delve into the field of thin film optical diagnostics or wants a single source book of well-organized and very high-density information on this subject.\"" --William G. Breiland, Sandia National Laboratories, OPTICAL ENGINEERING

This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, in]

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